PEGASUS - IPFN

N-Graphene-Metal-Oxide (Sulfide) hybrid Nanostructures: Single-step plasma-enabled approach for energy storage applications. A. Dias, N. Bundaleska, E. Felizardo, D. Tsyganov, A. Almeida, A. M. Ferraria, A. M. Botelho do Rego, M. Abrashev, Th. Strunskus, N.M. Santosh, U. Cvelbar, J. Zavašnik, M.F.Montemor, M.M. Almeida, Patrícia A. Carvalho, J. Kissovski, L. L. Alves and E. Tatarova. Chemical Engineering Journal 430:4 (2022) 133153.
Advancing Li-ion storage performance with hybrid vertical carbon/Ni3S2-based electrodes. N.M. Santhosh, N. Shaji, P. Stražar, G. Filipič, J. Zavašnik, C.W. Ho, M. Nanthagopal, C.W. Lee and U. Cvelbar. Journal of Energy Chemistry 67 (2022) 8-10.
Free-Standing Graphene-carbon as negative and FeCoS as positive electrode for Asymmetric supercapacitor. K.K. Upadhyay, N. Bundaleska, M. Abrashev, J. Kissovski, N. Bundaleski, O. M. N. D. Teodoro, André Mão de Ferro, Rui Pedro Silva, A. Dias, E. Felizardo, E. Tatarova and M.F. Montemor Journal of Energy Storage 50:104637 (2022).
Double-discharge plasma system for deposition of carbon nanostructures. S. Marinov, V. Vachkov, I. Ivanov and Zh. Kissovski. Journal of Physics: Conference Series 2240:012020 (2022).
Simulations of a capacitor with graphene electrodes. V. Vachkov and Zh. Kissovski. Journal of Physics: Conference Series 2240:012036 (2022).
Controlled deposition of plasma‐polyaniline thin film by PECVD: Understanding the influence of aniline to argon ratio. C. Pattyn, D. Sciacqua, L. Kwiedor, A. Jagodar, T. Strunskus, F. Traeger, Th. Lecas, E. Kovacevic and J. Berndt. Plasma Processes and Polymers 19:e2100233 (2022).
Nitrogen incorporation in graphene nanowalls via plasma processes: Experiments and simulations. A. Jagodar, J. Berndt, E. von Wahl, T. Strunskus, T. Lecas, E. Kovacevic and P. Brault. Applied Surface Science 591:153165 (2022).
Hydrophilic to hydrophobic: Ultrafast conversion of cellulose nanofibrils by cold plasma fluorination. A. Oberlintner, V. Shvalya, A. Vasudevan, D. Vengust, B. Likozar, U. Cvelbar and U. Novak. Applied Surface Science 581 (2022) 152276.
Thermal stability studies of plasma deposited hydrogenated carbon nitride nanostructures. E. Kovacevic, T. Strunskus, N. M. Santhosh, J. Zavašnik, W.E.S. Unger, T. Sauvage, M.-R. Ammar, U. Cvelbar and J. Berndt. Carbon 184 (2021) 82-90.
Advanced Carbon-Nickel Sulfide Hybrid Nanostructures: Extending the Limits of Battery-Type Electrodes for Redox-Based Supercapacitor Applications. N.M. Santhosh, K. K. Upadhyay, P. Stražar, G. Filipi, J. Zavašnik, A. Mão De Ferro, R.P. Silva, E. Tatarova, M.D.F. Montemor and U. Cvelbar. ACS Applied Materials and Interfaces 13:17 (2021) 20559-205725.
Label‐Free Mycotoxin Raman Identification by High‐Performing Plasmonic Vertical Carbon Nanostructures. N.M. Santhosh, V. Shvalya, M. Modic, N. Hojnik, J. Zavašnik, J. Olenik, M. Košiček, G. Filipič, I. Abdulhalim and U. Cvelbar. Small 17:2103677 (2021).
Prospects for microwave plasma synthesized N‑graphene in secondary electron emission mitigation applications. N. Bundaleska, A. Dias, N. Bundaleski, E. Felizardo, J. Henriques, D. Tsyganov, M. Abrashev, E. Valcheva, J. Kissovski, A. M. Ferraria, A. M. Botelho do Rego, A. Almeida, J. Zavašnik, U. Cvelbar, O. M. N. D. Teodoro, Th. Strunskus and E. Tatarova. Scientific Reports 10:13013 (2020).
Simultaneous Synthesis and Nitrogen Doping of Free-Standing Graphene Applying Microwave Plasma. D. Tsyganov, N. Bundaleska, J. Henriques, E. Felizardo, A. Dias, M. Abrashev, J. Kissovski, A. M. Botelho do Rego, A. M. Ferraria and E. Tatarova. Materials 13:4213 (2020).
Oriented Carbon Nanostructures from Plasma Reformed Resorcinol-Formaldehyde Polymer Gels for Gas Sensor Applications. N.M. Santhosh, A. Vasudevan, A. Jurov, G. Filipič, J. Zavašnik and U. Cvelbar. Nanomaterials 10:1704 (2020).
N-Graphene nanowalls via plasma nitrogen incorporation and substitution: The experimental evidence. N.M. Santhosh, G. Filipič, E. Kovacevic, A. Jagodar, J. Berndt, T. Strunskus, H. Kondo, M. Hori, E. Tatarova and U. Cvelbar. Nano-Micro Letters 12:53 (2020).
Controlling the flux of reactive species: a case study on thin film deposition in an aniline/argon plasma. D. Sciacqua, C. Pattyn, A. Jagodar, E. von Wahl, T. Lecas, T. Strunskus, E. Kovacevic and J. Berndt. Scientific Reports 10:1 (2020) 1-8.
Microwave plasma-based direct synthesis of free-standing N-graphene. D. Tsyganov, N. Bundaleska, A. Dias, J. Henriques, E. Felizardo, M. Abrashev, J. Kissovski, A. M. Botelho do Rego, A. M. Ferraria and E. Tatarova. Physical Chemistry Chemical Physics 22 (2020) 4772-4787.
Low-temperature low-power PECVD synthesis of vertically aligned graphene. S. Hussain, E. Kovacevic, J. Berndt, N.M. Santhosh, C. Pattyn, A. Dias, T. Strunskus, M.-R. Ammar, A. Jagodar, M. Gaillard, C. Boulmer-Leborgne and U. Cvelbar. Nanotechnology 31:395604 (2020).
Free-standing N-Graphene as conductive matrix for Ni(OH)₂ based supercapacitive electrodes. K.K. Upadhyay, N. Bundaleska, M. Abrashev, N. Bundaleski, O.M.N.D. Teodoro, I. Fonseca, André Mão de Ferro, Rui Pedro Silva, E. Tatarova and M.F. Montemor. Electrochimica Acta 334:135592 (2020).
Low total electron yield graphene coatings produced by electrophoretic deposition. R. Aguincha, N. Bundaleski, N. Bundaleska, M. Novaković, J. Henriques, Z. Rakočević, E. Tatarova, O.M.N.D. Teodoro. Applied Surface Science 504:143870 (2020).
Deposition of vertical carbon nanosheets by MPECVD at atmospheric pressure. S. Marinov, V. Vachkov and Zh. Kissovski. Journal of Physics: Conference Series 1492:012032 (2020).
Measurement and control of the substrate temperature in vertical graphene nanosheets deposition. V. Vachkov and Zh. Kissovski. Journal of Physics: Conference Series 1492:012061 (2020).
Transparent elongation and compressive strain sensors based on aligned carbon nanowalls embedded in polyurethane. P. Slobodian, P. Riha, H. Kondo, U. Cvelbar, R. Olejnik, J. Matyas, M. Sekine and M. Hori. Sensors and Actuators A: Physical 306:111946 (2020).
Formation and behavior of negative ions in low pressure aniline-containing RF plasmas. C. Pattyn, E. Kovacevic, T. Strunskus, T. Lecas and J. Berndt. Scientific Reports 9:10886 (2019).
Tuning and fine morphology control of natural resource-derived vertical graphene. S. Alancherry, M.V. Jacob, K. Prasad, J. Joseph, O. Bazaka, R. Neupane, O. K. Varghese, O. Baranov, S. Xu, I. Levchenko and K. Bazaka. Carbon 159 (2019) 668-685.
Structure and photoluminescence properties of MoO_3−x/graphene nanoflake hybrid nanomaterials formed via surface growth. B.B. Wang, X.X. Zhong, B.M. Ming, M.K. Zhu, Y.A. Chen, U. Cvelbar and K. Ostrikov. Applied Surface Science 480 (2019) 1054-1062.
Nanocarbon phase transformations controlled by solubility of carbon species in gold nanoparticles. B.B. Wang, X.L. Qu, X.X. Zhong, Y.A. Chen, K. Zheng, U. Cvelbar and K. Ostrikov. Diamond and Related Materials 88 (2018) 282-289.
Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges. N.M. Santhosh, G. Filipič, E. Tatarova, O. Baranov, H. Kondo, M. Sekine, M. Hori, K.K. Ostrikov, U. Cvelbar. Micromachines 9:11 (2018) 565.
Large-scale synthesis of free-standing N-doped graphene using microwave plasma. N. Bundaleska, J. Henriques, M. Abrashev, A.M. Botelho do Rego, A.M. Ferraria, A. Almeida, F.M. Dias, E. Valcheva, B. Arnaudov, K.K. Upadhyay, M.F. Montemor and E. Tatarova. Scientific Reports 8:12595 (2018).
Microwave plasmas enabled synthesis of free standing carbon nanostructures at atmospheric pressure conditions. N. Bundaleska, D. Tsyganov, A. Dias, E. Felizardo, J. Henriques, F. M. Dias, M. Abrashev, J. Kissovski and E. Tatarova. Physical Chemistry Chemical Physics 20:20 (2018) 13810-13824.
Towards universal plasma-enabled platform for the advanced nanofabrication: plasma physics level approach. O. Baranov, S. Xu, K. Ostrikov, B. B. Wang, U. Cvelbar, K. Bazaka, and I. Levchenko. Reviews of Modern Plasma Physics 2 (1):4 (2018).
K. Bazaka, O. Baranov, U. Cvelbar, B. Podgornik, Y. Wang, S. Huang, L. Xu, J. W. M. Lim, I. Levchenko and S. Xu. Oxygen plasmas: a sharp chisel and handy trowel for nanofabrication. Nanoscale 10 (2018) 17494-17511.